October 12, 2007 (DigiTimes.com) – Leading solar cell maker Sharp is confident about the prospects for the thin-film solar cell market, expecting that meaningful penetration should be seen from 2013, said company solar systems group deputy manager Tatsuo Saga at the ongoing Taiwan International Photovoltaic (PV) Forum & Exhibition 2007 (October 11-12) in Taipei.
Saga is positive about the potential that thin-film solar cells may bring to the entire PV market and the company plans for related expansion to feed potential demand growth. With Sharp already having announced plans to construct a tenth-generation (10G) LCD plant and thin-film solar cell production complex in Japan, Saga said he expects to see capacity for thin-film solar cell production reach one peak gigawatt (GWp) in 2010, the same time frame that the complex will start operations.
Sharp will dedicate more resources for the development of solar cells based on gallium arsenide, Saga said. He added in saying that gallium arsenide will be one of the three key core materials beside amorphous silicon (a-Si) and crystallized silicon in Sharp’s solar cell material development.